High power impulse plasmas: Unterschied zwischen den Versionen
(Die Seite wurde neu angelegt: „'''408 OHigh power impulse plasmas for thin film deposition''' The Electrostatic Quadrupole Plasma (EQP) Mass Spectrometer is an experimental instrument used to ...“) |
|||
| Zeile 1: | Zeile 1: | ||
| − | '''408 | + | '''408 High power impulse plasmas for thin film deposition''' |
| − | deposition''' | ||
The Electrostatic Quadrupole Plasma (EQP) Mass Spectrometer is an experimental | The Electrostatic Quadrupole Plasma (EQP) Mass Spectrometer is an experimental | ||
Aktuelle Version vom 2. April 2012, 15:06 Uhr
408 High power impulse plasmas for thin film deposition
The Electrostatic Quadrupole Plasma (EQP) Mass Spectrometer is an experimental instrument used to measure the ion energy distribution function of atoms and ions in the plasma and to perform the mass analysis of the plasma. In this practical course the student will investigate the ion energy distribution function (IEDF) of metal and Ar atoms in High power impulse magnetron sputtering (HIPIMS) plasma discharge.
